SiO2 coated pure and doped titania pigments: low temperature CVD deposition and quantum chemical study
文献情報
Darren J. Simpson, Alagu Thilagam, Giuseppe P. Cavallaro, Klara Kaplun, Andrea R. Gerson
We report the in-flight CVD coating with smooth 1–2 nm thick SiO2 of pure and doped rutile particles via the oxidation of SiCl4 vapour introduced in the high temperature zone of a purpose built thermal reactor. The effectiveness of the coatings was determined by a combination of electron microscopy, surface analysis and photocatalytic measurements. No excess Cl was detected on the coated pigment particles indicating the complete oxidation of the SiCl4 precursor. In conjunction with the experimental outcomes of this optimised deposition process, we use first-principles density functional and semi-empirical quantum chemical calculations to examine the underlying electronic processes which determined the morphology and photocatalytic properties of the coated titania. We highlight the presence of low lying valence electronic states which reduce photocatalytic activity, and as a consequence decrease the population of photo-excited titania electrons which transfer to the surrounding matrix. Born–Oppenheimer molecular dynamics (MD) simulations indicate that the coating process is completed within the order of 10 ps.
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Journal of Chemical Sciences

Journal of the Indian Institute of Science

Medicinal Chemistry Research

Acta Metallurgica Sinica-English Letters

Polycyclic Aromatic Compounds

Journal of Asian Natural Products Research

Critical Reviews in Solid State and Materials Sciences

Chinese Journal of Chemistry

Topics in Catalysis

Main Group Chemistry
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