Influence of the type of carrier on ferromagnetism in a Si semiconductor implanted with Cu ions
文献情報
Li Wang, Denglu Hou, Chunfang Wu, Yuanping Shi, Shaohui Shi, Weikun Gao, Shunzhen Feng, Yingdi Liu, Li Li, Denghui Ji
Silicon semiconductor samples implanted with Cu ions and samples co-implanted with Cu- and N-ions were prepared by MEVVA and the Kaufman technique. None of the samples showed evidence of secondary phases. The initially n-type Si matrix, when implanted with Cu ions, changed to a p-type semiconductor, and the Cu ions existed as local Cu2+ cations in the p-type environment. As a result, none of the Cu-implanted samples were ferromagnetic at room temperature. The co-implanted samples, on the other hand, showed room-temperature ferromagnetism because the introduction of N ions made the carrier type change from p-type to n-type which is favorable for the appearance of Cu2+. First principles calculations were applied to understand the experimental phenomena. The formation energy was reduced by implanting N ions, and was decreased effectively with the increase in ratio of N to Cu ions. The density of states and spin density of states indicated that the hybridization of s, p and d electrons induced ferromagnetism at 0 K. Particularly, we proposed possible exchange interactions between the Cu2+–N−(N4+)–Cu2+ ions to explain the ferromagnetism mechanism.
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