Controlled thiol–ene post-polymerization reactions on polyferrocenylsilane homopolymers and block copolymers

文献情報

出版日 2013-02-13

DOI 10.1039/C3PY21129K

インパクトファクター 5.582

著者

Laurent Chabanne, Stefan Pfirrmann, David J. Lunn, Ian Manners

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要旨

Various thiols were reacted with poly(ferrocenylmethylvinylsilane) (PFMVS) homopolymers using the radical-mediated thiol–ene reaction with a view to preparing metallopolymers with diverse functional groups. Post-polymerization thiol–ene reactions on poly(ferrocenyldimethylsilane)-b-poly(ferrocenylmethylvinylsilane) (PFDMS-b-PFMVS) diblock copolymers with dodecanethiol and octadecanethiol afforded diblocks with a long hexane-soluble block and a short crystalline, hexane-insoluble PFDMS block. The thiol–ene reactions provided sufficient control to allow access to diblocks that were partially substituted, thus leaving vinyl groups that might subsequently be used for further post-polymerization reactions.

掲載誌

Polymer Chemistry

CiteScore: 8.6

自己引用率: 7.3%

年間論文数: 457

Polymer Chemistry welcomes submissions in all areas of polymer science that have a strong focus on macromolecular chemistry. Manuscripts may cover a broad range of fields, yet no direct application focus is required.

Controlled thiol–ene post-polymerization reactions on polyferrocenylsilane homopolymers and block copolymers

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