Base-amplifying silicone resins generating aliphatic secondary amines autocatalytically: synthesis, characterization and application to positive-working photoresists

文献情報

出版日 2014-09-12

DOI 10.1039/C4PY01096E

インパクトファクター 5.582

著者

K. Arimitsu, H. Kobayashi, M. Furutani, T. Gunji, Y. Abe

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要旨

New base-sensitive silicone resins bearing base-amplifying units that autocatalytically transform into aliphatic primary or secondary amino groups were designed and synthesized. Photogenerated amines from photobase generators by 254 nm light irradiation triggered a base-catalysed autocatalytic reaction, referred to as a base proliferation reaction, during post-exposure baking at 100 °C. This gave a positive-working developable photoresist with a 2 wt% lactic acid aqueous solution. A photosensitivity of 0.3 mJ cm−2 was achieved, and 3 × 3 μm line-and-space patterns were successfully fabricated using a 0.7 μm thick film of the polymer.

掲載誌

Polymer Chemistry

CiteScore: 8.6

自己引用率: 7.3%

年間論文数: 457

Polymer Chemistry welcomes submissions in all areas of polymer science that have a strong focus on macromolecular chemistry. Manuscripts may cover a broad range of fields, yet no direct application focus is required.

Base-amplifying silicone resins generating aliphatic secondary amines autocatalytically: synthesis, characterization and application to positive-working photoresists

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